ChEmpower Announces Chakra™, the First Functional Pad for Abrasive-Free Planarization

ChEmpower’s launch of Chakra, the industry’s first family of functional pads for abrasive‑free CMP, marks an important milestone for next‑generation semiconductor manufacturing. By replacing abrasive slurries with a chemically reactive pad and polishing fluid, Chakra is designed to improve yield, reduce water and waste, and help enable advanced AI chips, HBM, and cutting‑edge packaging flows.

Read their full release on MarketWire here. And check out SiliconAngle’s take here.